Hardware License


Documentation License

CC BY 4.0 International

Please refer to the following the guidelines for the OSHWA certification program. The CERN-OHL-P is roughly  analogous to the MIT open source software license, and the CC BY 4.0 will cover all of your documentation and other supporting information. Together these are designed to clear the way for a larger community to jump in to make/modify/improve the gear while retaining a sense of origin. 


The BE Mask is a design derivative of the Montana Mask created by  Dr. Dusty Richardson, Dr. Spencer Zaugg and Colton Zaugg. Their work is licensed under a non-commercial open source license. Material has been modified from the Version 1 from their website.

Attribution Guide

If supplied, attribution provides the name of the creator and attribution parties, a copyright notice, a license notice, a disclaimer notice, and a link to the material. You must indicate if you modified the material and retain an indication of previous modifications. Example below:

This project link is a design derivative of the BE Mask created by the Buffalo e-NABLE Team.
This work is licensed under a Creative Commons Attribution-ShareAlike 4.0 International License (CC BY 4.0) and CERN OHL-P. Material has been modified from the BE Mask Version 1.


The 3D printed mask information presented here is intended to assist the general public during the current global pandemic related to COVID-19 and the related nationwide shortage of personal protective equipment. Please be aware that this mask design is not intended to replace standard protective equipment such as N95 masks or surgical masks when that equipment is available. The use of these 3D printed masks has not been fully tested and has not been approved by federal or state authorities. The individuals associated with developing and producing this mask design assume no liability and make no representations, warranties, or guarantees regarding the safety, efficacy, or appropriate use of these masks in any particular situation. Each facility should test each batch of masks prior to relying on them for protection. Use of this information for any purpose is at the maker’s and user’s own risk